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49 items found for: Chemical Mechanical Polishing (CMP) Description Category Manufacturer Model Part Price AMAT Mirra Ontrak Chemical Mechanical Polishing (CMP) AMAT Mirra Ontrak $1,150,000 APPLIED MATERIALS Mirra Mesa Mirra Mesa CMP System (Tungsten) 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra Mesa Inquire APPLIED MATERIALS Mirra Mesa Mirra Mesa CMP System (Oxide) 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra Mesa Inquire APPLIED MATERIALS Mirra 3400 Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Tungsten Process 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra 3400 Inquire APPLIED MATERIALS Mirra 3400 Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, STI Process 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra 3400 Inquire APPLIED MATERIALS Mirra 3400 Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, R&D Process 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra 3400 Inquire APPLIED MATERIALS Mirra 3400 Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Poly Process 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra 3400 Inquire APPLIED MATERIALS Mirra 3400 Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Poly Process 8"" Chemical Mechanical Polishing (CMP) APPLIED MATERIALS Mirra 3400 Inquire Applied Materials Mirra Mesa Dry In/Dry Out Tungsten CMP System 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra Mesa Inquire Applied Materials Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Tungsten Process 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra 3400 Inquire Applied Materials Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, STI Process 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra 3400 Inquire Applied Materials Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, R&D Process 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra 3400 Inquire Applied Materials Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Poly Process200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra 3400 Inquire Applied Materials Mirra Mesa Dry In/Dry Out Oxide CMP System 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra Mesa Inquire Applied Materials Mirra 3400 CMP System (3 Platen/4 Head) w/ SMIF, Interface Type: Rorze 1VRS8150-W20, Poly Process 200mm Chemical Mechanical Polishing (CMP) Applied Materials Mirra 3400 Inquire DNS AS 2000 AS 2000 Post CMP Clean System, Tungsten Processed Wafers 8"" Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 AS 2000 Post CMP Clean System, STI Processed Wafers 8"" Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 AS 2000 Post CMP Clean System, Poly Processed Wafers 8"" Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 AS 2000 Post CMP Clean System, R&D Processed Wafers 8"" Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 AS 2000 Post CMP Clean System, Poly Processed Wafers 8"" Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 Post CMP Clean System, Tungsten Processed Wafers 200mm Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 Post CMP Clean System, STI Processed Wafers, 200mm Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 Post CMP Clean System, R&D Processed Wafers,200mm Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 Post CMP Clean System, Poly Processed Wafers 200mm Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire DNS AS 2000 Post CMP Clean System, Poly Processed Wafers 200mm Chemical Mechanical Polishing (CMP) DNS AS 2000 Inquire Page 1 of 2 Previous 1 | 2 Next Go To Page: Copyright 2008 wSemi.com - All Rights Reserved.